Preparation of In2o3
F thin films grown by spray pyrolysis technique
Article Ecrit par: Rozati, S. M. ; Ganj, T. ;
Résumé: Transparent conducting fluorine doped indium oxide (In<subscript>2O<subscript>3:F) thin films have been deposited on Corning 7059 glass substrates by the spray pyrolysis technique. The structural, electrical, and optical properties of these films were investigated as a function of substrate temperature. The X-ray diffraction pattern of the films deposited at lower substrate temperature (T<subscript>s = 300 <degree>C) showed no peaks of In<subscript>2O<subscript>3:F. In the useful range for deposition (i.e. 425-600 <degree>C), the orientation of the films was predominantly [400]. For the 4500 A thick In<subscript>2O<subscript>3:F deposited with an F content of 10-wt%, the minimum sheet resistance was 120 <OMEGA> and average transmission in the visible wavelength rang (400-700 nm) was 88%.
Langue:
Anglais