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تفاصيل البطاقة الفهرسية

Atomic size effects on the hardness of RF sputtered Al-Cu(rich) thin films

مقال من تأليف: Draissia, M. ; Debili, M. Y. ;

ملخص: The RF(13.56 MHz) cathodic magnetron sputtered Al-86.17 to 100 at.%Cu thin films are a single [alpha]Cu solid solution phase. The microhardness regularly increases with Al concentration. This phenomenon of strengthening of copper by the means of aluminium is essentially due to a combination of effects of the solid solution and a refinement of grain size.


لغة: إنجليزية