ملخص: Titanium nitride films deposited on NaCl single crystal substrates were prepared using reactive d.c. magnetron sputtering under deposition conditions yielding near stoichiometric films. Several large areas ([phi][approximate]20 nm) of superstructure were formed by annealing these films under vacuum at 873 K for 30 min. The existence of a superstructure was observed by high resolution transmission electron microscopy (HRTEM) in thin films which were annealed at 873 K. Only the normal structure was observed below this temperature.

لغة: إنجليزية